US Patent Issued to Applied Materials on Sept. 2 for "Parallel atomic layer deposition of target element interiors" (Indian, American Inventors)

ALEXANDRIA, Va., Sept. 3 -- United States Patent no. 12,404,584, issued on Sept. 2, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Parallel atomic layer deposition of target element interiors" was invented by Yogesh Tomar (Madhya Pradesh, India), Nikshep Patil (Hubballi, India), Kirubanandan Shanmugam Naina (Bangalore, India), Hanish Kumar Panavalappil Kumarankutty (Karnataka, India), Gayatri Natu (Maharashtra, India), Mahesh Chelvaraj Arcot (Maharashtra, India), Senthil Kumar Nattamai Subramanian (Hosur, India), Hari Venkatesh Rajendran (Tamil Nadu, India), Michael Rice (Pleasanton, Calif.) and Christopher Laurent Beaudry (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A met...