US Patent Issued to APPLIED MATERIALS on Sept. 2 for "Methods and apparatus for enhancing selectivity of titanium and titanium silicides during chemical vapor deposition" (California Inventors)

ALEXANDRIA, Va., Sept. 3 -- United States Patent no. 12,406,849, issued on Sept. 2, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).

"Methods and apparatus for enhancing selectivity of titanium and titanium silicides during chemical vapor deposition" was invented by Takashi Kuratomi (San Jose, Calif.), I-Cheng Chen (San Jose, Calif.), Avgerinos V. Gelatos (Scotts Valley, Calif.), Pingyan Lei (San Jose, Calif.), Mei Chang (Saratoga, Calif.) and Xianmin Tang (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and apparatus for selectively depositing a titanium material layer atop a substrate having a silicon surface and a dielectric surface are disclosed. In embodiments an app...