US Patent Issued to Applied Materials on Sept. 16 for "Shadow mask apparatus and methods for variable etch depths" (Massachusetts, Connecticut, New York, California Inventors)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,417,892, issued on Sept. 16, was assigned to Applied Materials Inc..

"Shadow mask apparatus and methods for variable etch depths" was invented by Joseph C. Olson (Beverly, Mass.), Morgan Evans (Manchester, Mass.), Thomas Soldi (West Simsbury, Conn.), Rutger Meyer Timmerman Thijssen (Sunnyvale, Calif.) and Maurice Emerson Peploski (Potsdam, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of producing grating materials with variable height are provided. In one example, a method may include providing a grating material atop a substrate, and positioning a shadow mask between the grating material and an ion source, wherein the shadow mask is sep...