US Patent Issued to Applied Materials on Sept. 16 for "Molybdenum(0) precursors for deposition of molybdenum films" (Singaporean, American Inventors)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,415,824, issued on Sept. 16, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Molybdenum(0) precursors for deposition of molybdenum films" was invented by Chandan Kr Barik (Singapore), John Sudijono (Singapore), Chandan Das (Singapore), Doreen Wei Ying Yong (Singapore), Mark Saly (Santa Clara, Calif.), Bhaskar Jyoti Bhuyan (San Jose, Calif.) and Feng Q. Liu (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Molybdenum(0) and coordination complexes are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybd...