US Patent Issued to Applied Materials on Sept. 16 for "Method for forming multi-depth optical devices" (California Inventors)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,416,759, issued on Sept. 16, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Method for forming multi-depth optical devices" was invented by Rutger Meyer Timmerman Thijssen (Sunnyvale, Calif.) and Guannan Chen (Belmont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An optical device and a method of forming an optical device having multi-depth optical device structures with a refractive index greater than or equal to 2.0 are provided. The optical devices and method include forming first matrix stack structures and second matrix stack structures. Adjacent first matrix stack structures form first vias having a first depth and adjace...