ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,438,050, issued on Oct. 7, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Electronic device fabrication using area-selective deposition" was invented by Zachary J. Devereaux (Webberville, Mich.), Bhaskar Jyoti Bhuyan (Santa Clara, Calif.), Thomas Joseph Knisley (Livonia, Mich.), Zeqing Shen (San Jose, Calif.), Susmit Singha Roy (Campbell, Calif.), Mark J. Saly (Santa Clara, Calif.) and Abhijit Basu Mallick (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes selectively forming at least one passivation layer on at least one first conductive layer disposed in a first interlevel dielectric (ILD) layer, selective...