US Patent Issued to Applied Materials on Oct. 7 for "Capacitive sensors and capacitive sensing locations for plasma chamber condition monitoring" (California Inventors)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,437,979, issued on Oct. 7, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Capacitive sensors and capacitive sensing locations for plasma chamber condition monitoring" was invented by Yaoling Pan (Santa Clara, Calif.), Patrick John Tae (Palo Alto, Calif.), Leonard Tedeschi (San Jose, Calif.), Philip Allan Kraus (San Jose, Calif.) and Michael D. Willwerth (Campbell, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Capacitive sensors and capacitive sensing locations for plasma chamber condition monitoring are described. In an example, a plasma processing chamber includes a chamber wall surrounding a processing region. A chamber lid is o...