US Patent Issued to Applied Materials on Oct. 28 for "Auxiliary plasma source for robust ignition and restrikes in a plasma chamber" (American, French Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,456,607, issued on Oct. 28, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Auxiliary plasma source for robust ignition and restrikes in a plasma chamber" was invented by Kartik Ramaswamy (San Jose, Calif.), Kostiantyn Achkasov (Lyons, France), Nicolas J. Bright (Mountain Lakes, N.J.), Fernando M. Silveira (Livermore, Calif.), Yang Yang (Cupertino, Calif.) and Yue Guo (Redwood City, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor processing system may include a semiconductor processing chamber configured to execute a recipe on a semiconductor wafer. The system may include a first plasma source to provide plasma to th...