US Patent Issued to APPLIED MATERIALS on Oct. 28 for "Atomic layer deposition on optical structures" (California Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,454,751, issued on Oct. 28, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).

"Atomic layer deposition on optical structures" was invented by Jinrui Guo (San Jose, Calif.), Ludovic Godet (Sunnyvale, Calif.) and Rutger Meyer Timmerman Thijssen (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure generally relate to processing an optical workpiece containing grating structures on a substrate by deposition processes, such as atomic layer deposition (ALD). In one or more embodiments, a method for processing an optical workpiece includes positioning a substrate containing a first layer within a p...