US Patent Issued to Applied Materials on Oct. 21 for "Semiconductor fabrication using process control parameter matrix" (California Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,451,380, issued on Oct. 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Semiconductor fabrication using process control parameter matrix" was invented by Sivakumar Dhandapani (San Jose, Calif.) and Jun Qian (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of processing substrates includes: subjecting each respective first substrate of a first plurality of substrates to a process that modifies a thickness of an outer layer of the respective first substrate; generating a plurality of groups of process parameter values, wherein the plurality of process parameters comprise a plurality of control parameters and a ...