US Patent Issued to APPLIED MATERIALS on Oct. 21 for "Rotary substrate support for aligning a substrate" (American, Indian Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,449,738, issued on Oct. 21, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).

"Rotary substrate support for aligning a substrate" was invented by Nagesha Jansale Venkatesha (Bengaluru, India) and Yacov Elgar (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of substrate supports for aligning a substrate are provided herein. In some embodiments, a substrate support for aligning a substrate include: a base plate; a rotary assembly including a stator coupled to the base plate and a rotor rotatably coupled to the stator via a bearing disposed therebetween; a bellows assembly fixed to the rotor; and a lever having a ...