US Patent Issued to Applied Materials on Oct. 21 for "Polishing apparatus using neural network for monitoring" (American, Russian Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,447,577, issued on Oct. 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Polishing apparatus using neural network for monitoring" was invented by Kun Xu (Sunol, Calif.), Hassan G. Iravani (Sunnyvale, Calif.), Denis Ivanov (St. Petersburg, Russia), Boguslaw A. Swedek (Morgan Hill, Calif.), Shih-Haur Shen (Sunnyvale, Calif.), Harry Q. Lee (Los Altos, Calif.) and Benjamin Cherian (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of polishing a layer on the substrate at a polishing station includes the actions of monitoring the layer during polishing at the polishing station with an in-situ monitoring system to gene...