US Patent Issued to Applied Materials on Oct. 21 for "Low resistivity metal contact stack" (California Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,453,086, issued on Oct. 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Low resistivity metal contact stack" was invented by Annamalai Lakshmanan (Fremont, Calif.), Jacqueline S. Wrench (San Jose, Calif.), Feihu Wang (San Jose, Calif.), Yixiong Yang (Fremont, Calif.), Joung Joo Lee (San Jose, Calif.) and Srinivas Gandikota (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods for depositing a metal contact stack on a substrate are described. The metal stack includes a metal cap layer and a molybdenum conductor layer. The method includes depositing the metal cap layer on the substrate by physical vapor deposition ...