ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,447,579, issued on Oct. 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Chemical mechanical polishing vibration measurement using optical sensor" was invented by Jeonghoon Oh (Saratoga, Calif.), Thomas H. Osterheld (Mountain View, Calif.) and Steven M. Zuniga (Soquel, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A chemical mechanical polishing apparatus includes a platen to support a polishing pad, a carrier head to hold a substrate against a polishing surface of the polishing pad, a motor to generate relative motion between the platen and the carrier head so as to polish an overlying layer on the substrate, an in-situ vibrat...