ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,440,942, issued on Oct. 14, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Pressure signals with different frequencies during friction monitoring to provide spatial resolution" was invented by Thomas Li (Santa Clara, Calif.) and Benjamin Cherian (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of polishing includes holding a substrate with a carrier head against a polishing surface of a polishing pad, generating relative motion between the substrate and polishing pad, applying a first pressure in a first cyclic waveform having a first frequency to a first region of the substrate, applying a second pressure in a s...