US Patent Issued to Applied Materials on Oct. 14 for "Machine measurement metrology frame for a lithography system" (California Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,443,116, issued on Oct. 14, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Machine measurement metrology frame for a lithography system" was invented by Ulrich Mueller (Berkeley, Calif.), David Arthur Markle (Pleasanton, Calif.) and Stephen F. Sporer (Berkeley, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to apparatus and methods for performing maskless lithography processes. A substrate processing apparatus includes a slab with a plurality of guiderails coupled to and extending along the slab. A first shuttle is disposed on the plurality of guiderails, a second shuttle is disposed on the first shu...