US Patent Issued to Applied Materials on Oct. 14 for "High conductance divert line architecture" (American, Indian Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,621, issued on Oct. 14, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"High conductance divert line architecture" was invented by Abhijit A. Kangude (San Jose, Calif.), Elizabeth Neville (Sunnyvale, Calif.) and Arun Chakravarthy Chakravarthy (Panruit, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "Exemplary semiconductor processing systems may include a lid plate and a gas splitter. The gas splitter may be seated on the lid plate. The gas splitter may include a top surface and a plurality of side surfaces. The gas splitter may define a gas inlet, a gas outlet, a gas lumen that extends between and fluidly couples the gas inlet w...