US Patent Issued to Applied Materials on Oct. 14 for "Apparatus, systems, and methods of using an atmospheric epitaxial deposition transfer chamber" (German Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,442,073, issued on Oct. 14, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Apparatus, systems, and methods of using an atmospheric epitaxial deposition transfer chamber" was invented by Thomas Ackermann (Feichten, Germany) and Robert Huber (Feichten, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "Implementations of the present disclosure relate to apparatus, systems, and methods of using a transfer chamber. In one or more implementations, gaseous impurities are reduced in a transfer chamber. In one implementation, a method includes receiving user input via a user interface indicating for the substrate processing system to conduct...