ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,460,299, issued on Nov. 4, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).
"Wet clean spray process chamber for substrates" was invented by Jason Rye (Kalispell, Mont.) and Nolan Layne Zimmerman (Kalispell, Mont.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of wet clean chambers are provided herein. In some embodiments, a wet clean chamber includes: a deck plate; a substrate support that is rotatable and configured to support a substrate; a rotor disposed about and configured to rotate with the substrate support, wherein the rotor includes an upper fluid collection region disposed radially outward of the substrate support in p...