ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,459,011, issued on Nov. 4, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Steam treatment stations for chemical mechanical polishing system" was invented by Haosheng Wu (San Jose, Calif.), Jianshe Tang (San Jose, Calif.), Hari Soundararajan (Sunnyvale, Calif.), Shou-Sung Chang (Mountain View, Calif.), Hui Chen (San Jose, Calif.), Chih Chung Chou (San Jose, Calif.), Alexander John Fisher (Santa Clara, Calif.) and Paul D. Butterfield (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus for steam treatment of a conditioner head and/or conditioner disk in a chemical mechanical polishing system includes a conditioner c...