US Patent Issued to Applied Materials on Nov. 4 for "Selective trench modification using directional etch" (Massachusetts Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,045, issued on Nov. 4, was assigned to Applied Materials Inc..

"Selective trench modification using directional etch" was invented by Tassie Andersen (Salem, Mass.) and Shurong Liang (Lynnfield, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein are approaches for device modification, namely, trench elongation. In one approach, a method may include providing a substrate including a plurality of surface features defining a plurality of trenches, wherein a first trench has a first trench length extending in a first direction, wherein a second trench connected to the first trench has a second trench length extending in a second direct...