ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,030, issued on Nov. 4, was assigned to Applied Materials Inc (Santa Clara, Calif.).
"Selective oxidation of a substrate" was invented by Hansel Lo (Santa Clara, Calif.) and Chris Olsen (Santa Clara, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Described herein is a method for selectively oxidizing a substrate. The method includes forming a non-conformal layer on at least one side surface of a trench or a hole of a substrate. After forming the non-conformal layer, the at least one trench or at least one hole may be selectively oxidized, wherein oxidation of the non-conformal layer and an exposed portion of the at least one side wall not cover...