US Patent Issued to APPLIED MATERIALS on Nov. 4 for "Method of tuning film properties of metal nitride using plasma" (California Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,093, issued on Nov. 4, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).

"Method of tuning film properties of metal nitride using plasma" was invented by Wenyi Liu (Santa Clara, Calif.), Wei Tang (Santa Clara, Calif.), Srinivas Gandikota (Santa Clara, Calif.), Yixiong Yang (San Jose, Calif.), Yong Wu (Mountain View, Calif.), Jianqiu Guo (San Jose, Calif.), Arkaprava Dan (San Jose, Calif.) and Mandyam Sriram (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for forming a metal nitride layer on a substrate includes exposing a substrate having features formed therein to a first deposition gas mixture including metal s...