US Patent Issued to Applied Materials on Nov. 4 for "Inductively coupled plasma source with radial coil network" (California Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,011, issued on Nov. 4, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Inductively coupled plasma source with radial coil network" was invented by Yuhui Zhang (Sunnyvale, Calif.), Yang Yang (Cupertino, Calif.), Zhimin Jiang (Santa Clara, Calif.), Kartik Ramaswamy (San Jose, Calif.) and Alok Ranjan (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus for generating plasma inductively in a process chamber leverages a radial coil network. In some embodiments, the radial coil network is a planar structure comprising an inner conductor with an open center where at least one RF power source is electrically connected...