US Patent Issued to Applied Materials on Nov. 4 for "In-situ conditioner disk cleaning during CMP" (California Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,459,078, issued on Nov. 4, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"In-situ conditioner disk cleaning during CMP" was invented by Haosheng Wu (San Jose, Calif.), Shou-Sung Chang (Mountain View, Calif.), Jianshe Tang (San Jose, Calif.), Jeonghoon Oh (Saratoga, Calif.), Chad Pollard (San Jose, Calif.), Chih Chung Chou (San Jose, Calif.), Ningzhuo Cui (Santa Clara, Calif.) and Hui Chen (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A polishing system includes a platen to hold a polishing pad, a carrier head to hold a substrate against the polishing pad, a conditioner including a conditioner head to hold a conditioner ...