US Patent Issued to Applied Materials on Nov. 4 for "Directional selective junction clean with field polymer protections" (California Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,052, issued on Nov. 4, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Directional selective junction clean with field polymer protections" was invented by Yu Lei (Belmont, Calif.), Xuesong Lu (San Jose, Calif.), Tae Hong Ha (San Jose, Calif.), Xianmin Tang (San Jose, Calif.), Andrew Nguyen (San Jose, Calif.), Tza-Jing Gung (San Jose, Calif.), Philip A. Kraus (San Jose, Calif.), Chung Nang Liu (Foster City, Calif.), Hui Sun (San Jose, Calif.) and Yufei Hu (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Described is a process to clean up junction interfaces for fabricating semiconductor devices involving forming low-resi...