ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,482,646, issued on Nov. 25, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Processes for depositing SiB films" was invented by Aykut Aydin (Sunnyvale, Calif.), Rui Cheng (Santa Clara, Calif.), Karthik Janakiraman (San Jose, Calif.), Abhijit Basu Mallick (Fremont, Calif.), Takehito Koshizawa (San Jose, Calif.) and Bo Qi (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure generally relate to processes for forming silicon- and boron-containing films for use in, e.g., spacer-defined patterning applications. In an embodiment, a spacer-defined patterning process is provided. The process includ...