US Patent Issued to Applied Materials on Nov. 25 for "Efficient dechucking and particle management in process chambers" (California Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,482,692, issued on Nov. 25, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Efficient dechucking and particle management in process chambers" was invented by Arvinder Manmohan Singh Chadha (San Jose, Calif.) and Christopher Laurent Beaudry (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method including using a plurality of clamp electrodes of a substrate support to electrostatically secure a substrate during a process. The method further includes actively discharging a residual charge from the substrate after completion of the process based on at least one of contacting a backside of the substrate with a conductive lif...