US Patent Issued to Applied Materials on Nov. 25 for "Chemical-dose substrate deposition monitoring" (California Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,480,212, issued on Nov. 25, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Chemical-dose substrate deposition monitoring" was invented by Albert Barrett Hicks (Sunnyvale, Calif.) and Serghei Malkov (Hayward, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method including receiving, by a processing device, first data characterizing a film on a surface of a substrate processed within a recess of a sensor assembly positioned in a first region of a processing chamber. The processed surface of the film corresponds to a substrate processing procedure. The method further includes determining, based on the first data, a rate of advancem...