US Patent Issued to Applied Materials on Nov. 25 for "Apparatus and method for delivering a plurality of waveform signals during plasma processing" (California Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,482,633, issued on Nov. 25, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Apparatus and method for delivering a plurality of waveform signals during plasma processing" was invented by James Rogers (Los Gatos, Calif.) and Katsumasa Kawasaki (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure generally relate to a system used in a semiconductor device manufacturing process. More specifically, embodiments provided herein generally include apparatus and methods for synchronizing and controlling the delivery of an RF bias voltage signal and a pulsed voltage waveform to one or more electrodes...