US Patent Issued to Applied Materials on Nov. 18 for "System and method for ion source temperature control using symmetric or asymmetric application of force" (Massachusetts Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,087, issued on Nov. 18, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"System and method for ion source temperature control using symmetric or asymmetric application of force" was invented by Ryan Prager (Beverly, Mass.) and John Alexander Walder (Beverly, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An ion source is disclosed, in which the compression force applied to the faceplate on the two sides of the extraction aperture may be varied independently. Modifying the compression force between the faceplate and arc chamber can enable temperature control of the ion source by modifying the thermal contact resistance between the...