US Patent Issued to Applied Materials on Nov. 18 for "Semiconductor substrate support with internal channels" (California Inventor)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,131, issued on Nov. 18, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Semiconductor substrate support with internal channels" was invented by Vijay D. Parkhe (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Exemplary substrate support assemblies may include an electrostatic chuck body defining a substrate support surface. The support assemblies includes a support stem coupled with the electrostatic chuck body. The support assemblies includes an electrode embedded within the electrostatic chuck body proximate the substrate support surface. The support assemblies includes a ground electrode embedded within the electros...