US Patent Issued to Applied Materials on Nov. 18 for "Model-based characterization of plasmas in semiconductor processing systems" (California Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,094, issued on Nov. 18, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Model-based characterization of plasmas in semiconductor processing systems" was invented by Soonwook Jung (Campbell, Calif.), Kenneth D. Schatz (Los Altos, Calif.) and Hunkee Cho (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of characterizing plasmas during semiconductor processes may include receiving operating conditions for a semiconductor process, where the semiconductor process may be configured to generate a plasma inside of a chamber of a semiconductor processing system. The method may also include providing the operating condit...