ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,473,639, issued on Nov. 18, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Methods for forming films on substrates" was invented by Alexander N. Lerner (San Jose, Calif.), Roey Shaviv (Palo Alto, Calif.), Prashanth Kothnur (San Jose, Calif.), Satish Radhakrishnan (San Jose, Calif.) and Xiaozhou Che (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "One or more embodiments described herein generally relate to methods and systems for forming films on substrates in semiconductor processes. In embodiments described herein, a process system includes different materials each contained in separate ampoules. Each material is flowe...