ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,081, issued on Nov. 18, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Methods and apparatus for processing a substrate" was invented by Katsumasa Kawasaki (Los Gatos, Calif.), Kartik Ramaswamy (San Jose, Calif.), Yue Guo (Redwood City, Calif.), Chunlei Zhang (Santa Clara, Calif.), Sergio Fukuda Shoji (San Jose, Calif.), Jorge Zaninovich (Santa Clara, Calif.) and Smbat Kartashyan (Santa, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and apparatus for processing a substrate are provided herein. For example, apparatus can include a first voltage/current (V/I) probe configured to connect to an input side of a matching ne...