US Patent Issued to Applied Materials on Nov. 18 for "Grounding techniques for ESD polymeric fluid lines" (California Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,472,604, issued on Nov. 18, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Grounding techniques for ESD polymeric fluid lines" was invented by Chad Pollard (San Jose, Calif.), Shou-Sung Chang (Mountain View, Calif.) and Haosheng Wu (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A chemical mechanical polishing assembly includes a chemical mechanical polishing system, a fluid source, and a fluid delivery conduit to carry a fluid from the fluid source into the chemical mechanical polishing system. The polishing system has a platen to support a polishing pad, a carrier head to support a substrate and bring the substrate int...