US Patent Issued to Applied Materials on Nov. 11 for "Selective metal selectivity improvement with RF pulsing" (California Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,469,747, issued on Nov. 11, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Selective metal selectivity improvement with RF pulsing" was invented by Yi Xu (San Jose, Calif.), Yu Lei (Belmont, Calif.), Zhimin Qi (Fremont, Calif.), Aixi Zhang (Sunnyvale, Calif.) and Xianyuan Zhao (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the disclosure are directed to methods of removing metal oxide from a substrate surface by exposing the substrate surface to a hydrogen (H2) plasma and pulses of RF. In some embodiments, the substrate surface has at least one feature thereon, the at least one feature defining a trenc...