US Patent Issued to Applied Materials on Nov. 11 for "Radio-frequency (RF) matching network for fast impedance tuning" (California, Washington Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,469,680, issued on Nov. 11, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Radio-frequency (RF) matching network for fast impedance tuning" was invented by Yue Guo (Redwood City, Calif.), A N M Wasekul Azad (Santa Clara, Calif.), Kartik Ramaswamy (San Jose, Calif.), Nicolas J. Bright (Arlington, Wash.) and Yang Yang (San Diego).

According to the abstract* released by the U.S. Patent & Trademark Office: "Some embodiments are directed to a tuning circuit. The tuning circuit generally includes: a first impedance coupled between a first terminal and a second terminal of the tuning circuit, wherein the first terminal is coupled to a generator and the second terminal is cou...