US Patent Issued to Applied Materials on Nov. 11 for "Process characterization and correction using optical wall process sensor (OWPS)" (California, Idaho Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,467,136, issued on Nov. 11, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Process characterization and correction using optical wall process sensor (OWPS)" was invented by Jeffrey Yat Shan Au (Sunnyvale, Calif.), Sidharth Bhatia (Santa Cruz, Calif.), Zhaozhao Zhu (Milpitas, Calif.), Nicholas Ryan Pica (Meridian, Idaho), Varoujan Chakarian (San Jose, Calif.) and Chenfei Hu (Cupertino, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes receiving, by a processing device, first data from an optical sensor of a processing chamber. The method further includes processing the first data to obtain second data. The second dat...