US Patent Issued to Applied Materials on Nov. 11 for "Molybdenum monolithic physical vapor deposition target" (Indian, American Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,467,127, issued on Nov. 11, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Molybdenum monolithic physical vapor deposition target" was invented by Jianxin Lei (Fremont, Calif.), Kirankumar Neelasandra Savandaiah (Bangalore, India), Andrew Moe (Santa Clara, Calif.) and Madan Kumar Shimoga Mylarappa (Bangalore, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "The disclosure relates to a target for physical vapor deposition processes. In one embodiment, a physical vapor deposition (PVD) target, includes a monolithic target with a support region partially defined by a process face and radial sidewalls; and a recess within a mounting face...