US Patent Issued to Applied Materials on Nov. 11 for "Dry etching with etch byproduct self-cleaning" (American, Indian Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,469,715, issued on Nov. 11, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Dry etching with etch byproduct self-cleaning" was invented by Zhonghua Yao (Santa Clara, Calif.), Qian Fu (Pleasanton, Calif.), Mark J. Saly (Santa Clara, Calif.), Yang Yang (Cupertino, Calif.), Jeffrey W. Anthis (Redwood City, Calif.), David Knapp (Santa Clara, Calif.) and Rajesh Sathiyanarayanan (Bengaluru, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes providing, within an etch chamber, a base structure including a target layer disposed on a substrate, and an etch mask disposed on the target layer, dry etching, within the etch chamber, ...