ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,467,133, issued on Nov. 11, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Conformal molybdenum deposition" was invented by Srinivas Gandikota (Santa Clara, Calif.), Tuerxun Ailihumaer (Santa Clara, Calif.), Yixiong Yang (Fremont, Calif.), Seshadri Ganguli (Sunnyvale, Calif.) and Yogesh Sharma (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Conformally deposited molybdenum films having reduced resistivity and methods of forming the same are disclosed. The methods include converting an amorphous silicon layer to a metal layer by thermally soaking the amorphous silicon layer comprising silicon atoms in the presence of a m...