US Patent Issued to Applied Materials on Nov. 11 for "Broadband supply circuitry for a plasma processing system" (California Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,469,681, issued on Nov. 11, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Broadband supply circuitry for a plasma processing system" was invented by Tiefeng Shi (Santa Clara, Calif.), Gang Fu (Santa Clara, Calif.) and Keith A. Miller (Mountain View, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments provided herein generally include apparatus, plasma processing systems and methods for dynamic impedance matching across multiple frequency bands of a power source. An example method includes amplifying a broadband signal, splitting the amplified broadband signal across a plurality of channel paths coupled to an impedance matc...