US Patent Issued to Applied Materials on Nov. 11 for "Apparatus to detect and quantify radical concentration in semiconductor processing systems" (California Inventor)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,469,751, issued on Nov. 11, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Apparatus to detect and quantify radical concentration in semiconductor processing systems" was invented by Mehran Moalem (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments disclosed herein include a processing tool for measuring neutral radical concentrations. In an embodiment, the processing tool comprises a processing chamber, and a neutral radical mass spectrometry (NRMS) analyzer fluidically coupled to the processing chamber. In an embodiment, the NRMS analyzer comprises a first chamber fluidically coupled to the processing chamber, w...