US Patent Issued to Applied Materials on May 6 for "Methods of selective atomic layer deposition" (California, Michigan Inventors)

ALEXANDRIA, Va., June 10 -- United States Patent no. 12,291,779, issued on May 6, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Methods of selective atomic layer deposition" was invented by Bhaskar Jyoti Bhuyan (San Jose, Calif.), Mark Saly (Santa Clara, Calif.), David Thompson (San Jose, Calif.), Tobin Kaufman-Osborn (Sunnyvale, Calif.), Kurt Fredrickson (Sunnyvale, Calif.), Thomas Knisley (Livonia, Mich.) and Liqi Wu (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of depositing a film selectively onto a first substrate surface relative to a second substrate surface are described. The methods include exposing the substrate surfaces to a blocking compound to selectiv...