US Patent Issued to Applied Materials on May 6 for "Data inspection for digital lithography for HVM using offline and inline approach" (California Inventors)

ALEXANDRIA, Va., June 10 -- United States Patent no. 12,292,693, issued on May 6, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Data inspection for digital lithography for HVM using offline and inline approach" was invented by Chung-Shin Kang (San Jose, Calif.), Jun Yang (San Jose, Calif.) and Hongbin Ji (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "In embodiments of a digital lithography system, physical design data prepared at a data prep server in a hierarchical data structure. A leaf node comprises a repeater nod, comprising a bitmap image and a plurality of locations at which the bitmap appears in a physical design. At an EYE server, a repeater node bitmap is adjus...