US Patent Issued to Applied Materials on May 27 for "Multi-zone heater control for wafer processing equipment" (California Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,317,378, issued on May 27, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Multi-zone heater control for wafer processing equipment" was invented by Uwe P. Haller (San Jose, Calif.), Kiyki-Shiy N. Shang (Mountain House, Calif.) and Dmitry A. Dzilno (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of providing power to a plurality of heaters in multiple zones for wafer-processing equipment may include causing a voltage to be supplied to a plurality of power leads configured to supply the voltage to a plurality of different heating zones in a pedestal, causing current to be received from the plurality of different ...