ALEXANDRIA, Va., June 17 -- United States Patent no. 12,312,689, issued on May 27, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).

"Large-area high-density plasma processing chamber for flat panel displays" was invented by Suhail Anwar (Saratoga, Calif.), Yui Lun Wu (Castro Valley, Calif.), Jozef Kudela (Morgan Hill, Calif.), Carl A. Sorensen (Morgan Hill, Calif.) and Jeevan Prakash Sequeira (Milpitas, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments described herein provide a lid assembly of a chamber for independent control of plasma density and gas distribution within the interior volume of the chamber. The lid assembly includes a plasma generation system and a gas distribut...