US Patent Issued to Applied Materials on May 13 for "Optimization of a digital pattern file for a digital lithography device" (American, Taiwanese Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,302,641, issued on May 13, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Optimization of a digital pattern file for a digital lithography device" was invented by Chung-Shin Kang (San Jose, Calif.), Thomas L. Laidig (Richmond, Calif.), Yinfeng Dong (San Jose, Calif.), Yao-Cheng Yang (Mountain View, Calif.), Chen-Chien Hung (Tainan, Taiwan), Shivaraj Gururaj Kamalapura (Sunnyvale, Calif.) and Tsaichuan Kao (San Ramon, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A digital pattern generation system comprises a memory and a controller. The controller is coupled the memory and is configured to remove redundant cells from a digital p...