US Patent Issued to Applied Materials on May 13 for "Etching of metal oxides using fluorine and metal halides" (California Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,300,503, issued on May 13, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Etching of metal oxides using fluorine and metal halides" was invented by Keenan N. Woods (San Ramon, Calif.), Zhenjiang Cui (San Jose, Calif.) and Mark Saly (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of this disclosure provide methods for etching oxide materials. Some embodiments of this disclosure provide methods which selectively etch oxide materials over other materials. In some embodiments, the methods of this disclosure are performed by atomic layer etching (ALE). In some embodiments, the methods of this disclosure are per...